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CVD Graphene

Graphene monolayers are created by chemical vapor deposition (CVD) - an effective way to produce high-quality graphene on a large scale. CVD method is a good solution to provide high quality characteristics including imperviousness, high purity, perfect grain structure, stability and increased hardness over other coating methods.

The graphene, nanoscale allotrope of carbon, is a popular material with many useful properties, including light transparency and electrical conductivity. The manufacture process is based on combining gas molecules in a reaction chamber which is typically set at ambient temperature. When the combined gases contact with the substrate inside the reaction chamber (which is heated), a material film is created on the substrate surface as a result of chemical reaction. This process is fulfilled relatively quickly strictly following the settings of gas volumes, pressure, temperature, and time duration.

CVD method is a good solution to provide high quality characteristics including imperviousness, high purity, perfect grain structure, stability and increased hardness over other coating methods.
GR33_Cu GR33_Cu

Single- layered graphene on Copper foil

  €240
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GR33_Cu GR33_Cu

Single- layered graphene on Copper foil

  €240
Аdd to cart
GR11_Si GR11_Si

Single- layered graphene on silicon dioxide SiO2 substrate

  €65
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GR11_Si GR11_Si

Single- layered graphene on silicon dioxide SiO2 substrate

  €65
Аdd to cart

 

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